The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Apr. 18, 2012
Applicants:
Daniel T. Chiu, Seattle, WA (US);
Jason S. Kuo, Seattle, WA (US);
Inventors:
Daniel T. Chiu, Seattle, WA (US);
Jason S. Kuo, Seattle, WA (US);
Assignee:
University of Washington, Seattle, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); G01N 1/34 (2006.01); B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
G01N 1/34 (2013.01); B01L 3/50273 (2013.01); B01L 3/502753 (2013.01); B01L 2200/0668 (2013.01); B01L 2300/0681 (2013.01); B01L 2400/0409 (2013.01); B01L 2400/0415 (2013.01); B01L 2400/0487 (2013.01);
Abstract
This document discloses, among other things, a method and system for a substrate having a bypass region for fluid flow. The substrate includes a plurality of fluid flow channels with each channel configured to concurrently allow fluid flow while precluding passage of a target particle or object.