The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

May. 09, 2012
Applicants:

Mariana Rodica Munteanu, Santa Clara, CA (US);

Amith Kumar Murali, Fremont, CA (US);

Brian Josef Bartholomeusz, Palo Alto, CA (US);

Vardaan Chawla, Mountain View, CA (US);

Inventors:

Mariana Rodica Munteanu, Santa Clara, CA (US);

Amith Kumar Murali, Fremont, CA (US);

Brian Josef Bartholomeusz, Palo Alto, CA (US);

Vardaan Chawla, Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/56 (2006.01); C23C 14/06 (2006.01); C23C 14/58 (2006.01); C23C 16/30 (2006.01); H01L 31/032 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); C23C 14/0623 (2013.01); C23C 14/0629 (2013.01); C23C 14/5866 (2013.01); C23C 16/305 (2013.01); C23C 16/306 (2013.01); H01L 31/0322 (2013.01); Y02E 10/541 (2013.01);
Abstract

In one embodiment, a method includes depositing a chalcogenide precursor layer onto a substrate, introducing a cover into proximity with the precursor layer, and annealing the precursor layer in proximity with of the cover, where the annealing is performed in a constrained volume, and where the presence of the cover reduces decomposition of volatile species from the precursor layer during annealing.


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