The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
May. 23, 2011
Nobuhiko Tamura, Murrysville, PA (US);
Nobuhiko Tamura, Murrysville, PA (US);
ADVANTECH GLOBAL, LTD, Tortola, VG;
Abstract
In a shadow mask-substrate alignment method, a substrate is provided that includes a grate having a plurality of spaced bars and a shadow mask is provided that includes a grate having a plurality of spaced bars. Also provided is a light source-light receiver pair that defines a path of light therebetween. The grate of the substrate and the grate of the shadow mask are caused to be positioned in the path of the light. Thereafter, the orientation of the substrate, the shadow mask, or both are caused to be adjusted to position the grate of the substrate, the grate of the shadow mask, or both until a predetermined amount of light or a predetermined range of an amount of light on the path passing through the grates is received by the light receiver.