The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jan. 05, 2010
Applicants:

Hideomi Koinuma, Tokyo, JP;

Yukio Yamamoto, Kanagawa, JP;

Yuji Matsumoto, Kanagawa, JP;

Ryota Takahashi, Tokyo, JP;

Inventors:

Hideomi Koinuma, Tokyo, JP;

Yukio Yamamoto, Kanagawa, JP;

Yuji Matsumoto, Kanagawa, JP;

Ryota Takahashi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/044 (2013.01);
Abstract

It comprises a mask () having a first, a second and a third action edge (), and a drive means for moving the mask () relative to a substrate () in a uniaxial direction (A) whereby moving the mask at a fixed rate of movement to cause the edges to successively act on an identical substrate region while successively applying different materials thereto forms thin films of three components successively with respective film thickness gradients oriented in three different directions mutually angularly spaced apart by an angle of 120° to allow these films to overlap, thereby forming a ternary phase diagrammatic thin film


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