The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Feb. 25, 2013
Applicants:

Aruna Zhamu, Centerville, OH (US);

Mingchao Wang, Miamisburg, OH (US);

Lucy Fu, Centerville, OH (US);

Bor Z. Jang, Centerville, OH (US);

Inventors:

Aruna Zhamu, Centerville, OH (US);

Mingchao Wang, Miamisburg, OH (US);

Lucy Fu, Centerville, OH (US);

Bor Z. Jang, Centerville, OH (US);

Assignee:

Nanotek Instruments, Inc., Dayton, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/00 (2006.01); C01B 31/04 (2006.01);
U.S. Cl.
CPC ...
C01B 31/0469 (2013.01); C01B 31/0423 (2013.01);
Abstract

A process for producing a unitary graphene material, comprising: (a) preparing a graphene oxide (GO) gel having GO molecules dissolved in a fluid medium wherein the GO molecules contain higher than 20% by weight of oxygen; (b) dispensing and depositing a layer of GO gel onto a surface of a substrate to form a layer of deposited GO gel thereon, wherein the dispensing and depositing procedure includes shear-induced thinning; (c) removing the fluid medium from the deposited GO gel to form a GO layer having an inter-plane spacing dof 0.4 nm to 1.2 nm as determined by X-ray diffraction; and (d) heat treating the GO layer to form the unitary graphene material at a heat treatment temperature higher than 100° C. to an extent that dis decreased to a value of 0.3354 nm to 0.4 nm and the oxygen content is decreased to less than 5% by weight.


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