The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
May. 25, 2012
Thomas P. Russell, Amherst, MA (US);
Sung Woo Hong, Amherst, MA (US);
Doug Hyun Lee, Amherst, MA (US);
Soojin Park, Ulsan, KR;
Ting Xu, Berkeley, CA (US);
Thomas P. Russell, Amherst, MA (US);
Sung Woo Hong, Amherst, MA (US);
Doug Hyun Lee, Amherst, MA (US);
Soojin Park, Ulsan, KR;
Ting Xu, Berkeley, CA (US);
THE UNIVERSITY OF MASSACHUSETTS, Boston, MA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.