The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Aug. 24, 2012
Applicant:

Tsuyoshi Kimura, Osaka, JP;

Inventor:

Tsuyoshi Kimura, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/12 (2006.01); B24B 37/22 (2012.01); B24B 37/20 (2012.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
B24B 37/205 (2013.01); B24B 37/22 (2013.01); H01L 21/304 (2013.01);
Abstract

An object of the invention is to provide a polishing pad that is prevented from slurry leaks and has high optical detection accuracy. The present invention relates to a polishing pad comprising a polishing region, a cushion layer, and a support film layered in this order, wherein a light-transmitting region is provided on the support film and in an opening part that passes through the polishing region and the cushion layer; the light-transmitting region has a peripheral part and a recessed part on the surface of a polishing platen-side; the support film is layered on the peripheral part; and the support film is not layered on the recessed part, which remains open.


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