The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Jan. 16, 2013
Velayudhan Sahadevan, Beckley, WV (US);
Velayudhan Sahadevan, Beckley, WV (US);
Other;
Abstract
This invention relates to adaptive resistance inhibiting 100 to 1,000 Gy, single fraction radiosurgery with inverse Compton scattering gamma ray microbeam and nanobeam. The distance from two adjacent microbeams or the nanobeam generate peak and valley dose. Proliferation of normal tissue's clonogenic cells from low or no dose valley region to peak dose regions makes the normal tissue tolerance to to 100 to 1,000 Gy. The collilinear electron beam and gamma ray microbeam and nanobeam are generated in microfocus carbon tubes in a tissue equivalent primary collimator. Electron beam is absorbed by the tissue equivalent primary collimator. Focusing anode and magnets and multiwalled carbon nanotubes channels the microbeam and nanobeam as focused beams. Methods of spread out or spot scanned or raster scanned collilinear gamma ray microbeam and nanobeam radiosurgery are implemented. Adaptive resistance to cancer treatment is inhibited by inactivation of cancer cell's repair capabilities.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile