The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Jun. 13, 2013
M. Dalil Rahman, Flemington, NJ (US);
Clement Anyadiegwu, Parlin, NJ (US);
Douglas Mckenzie, Easton, PA (US);
Takanori Kudo, Bedminster, NJ (US);
Elizabeth Wolfer, Bethlehem, PA (US);
Salem K. Mullen, Florham Park, NJ (US);
M. Dalil Rahman, Flemington, NJ (US);
Clement Anyadiegwu, Parlin, NJ (US);
Douglas McKenzie, Easton, PA (US);
Takanori Kudo, Bedminster, NJ (US);
Elizabeth Wolfer, Bethlehem, PA (US);
Salem K. Mullen, Florham Park, NJ (US);
AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where Ris C-Calkyl, Ris C-Calkyl, Rand Rare independently hydrogen or C-Calkyl, and Ar' and Ar″ are independently phenylenic, or naphthalenic derived moieties, Rand Rare independently —OH or —(CH)OH where n=2-4, and Rand Rare independently hydrogen or C-Calkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.