The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Sep. 02, 2011
Applicants:
Osamu Nakayama, Niigata, JP;
Manabu Yada, Niigata, JP;
Inventors:
Osamu Nakayama, Niigata, JP;
Manabu Yada, Niigata, JP;
Assignee:
KURARAY CO., LTD., Kurashiki-shi, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07D 209/56 (2006.01); C07D 327/04 (2006.01); C07D 307/00 (2006.01); C07D 493/08 (2006.01); C07D 497/18 (2006.01); G03F 7/039 (2006.01); C08F 220/36 (2006.01); C08F 220/28 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07D 209/56 (2013.01); C07D 307/00 (2013.01); C07D 327/04 (2013.01); C07D 493/08 (2013.01); C07D 497/18 (2013.01); C08F 220/36 (2013.01); G03F 7/0397 (2013.01); C08F 220/28 (2013.01); C08F 2220/1833 (2013.01);
Abstract
The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1):