The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Jul. 05, 2005
Sung Hyun Kim, Daejeon, KR;
Jin Suek Kim, Daejeon, KR;
Kyung Jun Kim, Daejeon, KR;
Seung Hee Lee, Seoul, KR;
IL Eok Kwon, Seoul, KR;
Jeong AE Yoon, Masan-si, KR;
Sung Hyun Kim, Daejeon, KR;
Jin Suek Kim, Daejeon, KR;
Kyung Jun Kim, Daejeon, KR;
Seung Hee Lee, Seoul, KR;
Il Eok Kwon, Seoul, KR;
Jeong Ae Yoon, Masan-si, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
Disclosed is a display panel including a lower substrate, upper substrate, and a patterned spacer that causes the lower substrate and upper substrate to be spaced apart from each other by a predetermined distance, wherein the patterned spacer is obtained from a photosensitive resin composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photo polymerizable reactive resin binder; and (c) a polymerizable compound: (wherein each of R1-R5 has the same meaning as defined herein). A photosensitive resin composition for use in a patterned spacer is also disclosed, the composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photopolymerizable reactive resin binder; (c) a polymerizable compound; and (d) a solvent. The photosensitive resin composition shows high sensitivity and excellent properties related with development, and provides a patterned spacer having excellent strength, sensitivity, residue characteristics, film uniformity, residual film ratio, etc.