The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Jan. 25, 2010
Jae Woo Lee, Closter, NJ (US);
Cheol Ho Kim, Ulsan, KR;
Jae Ik Lee, Busan, KR;
Ho Kyeong Kim, Changwon-si, KR;
Hyo Kwan Leem, Busan, KR;
Jae Woo Lee, Closter, NJ (US);
Cheol Ho Kim, Ulsan, KR;
Jae Ik Lee, Busan, KR;
Ho Kyeong Kim, Changwon-si, KR;
Hyo Kwan Leem, Busan, KR;
STX OFFSHORE & SHIPBUILDING CO., LTD., Gyeongsangnam-Do, KR;
Abstract
The present invention relates to a method for the fast formation of a gas hydrate. More specifically, the present invention relates to a method for the formation of a fed-batch-type gas hydrate, the method including a first step i) of injecting a fresh aqueous solution containing a potential feed hydrate into a reactor, a second step ii) of feeding gas into the reactor in which the fresh aqueous solution containing the potential feed hydrate is injected in the first step, so as to pressurize said gas, and a third step iii) of injecting a surfactant solution into the reactor in which the gas is pressurized in the second step, as well as to a method for the formation of a batch-type gas hydrate, in which the first step is switched in sequence with the third step.