The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Feb. 01, 2013
Dh Technologies Development Pte. Ltd.;
Alexandre V. Loboda, Thornhill, CA;
Abstract
An ion source and an ion guide chamber are provided. The ion guide chamber having a gas flow, the gas flow having a longitudinal velocity and a transverse velocity. The ion guide chamber having an exit aperture and at least one ion guide. The at least one ion guide having an entrance end and an exit end with an exit cross-section wherein the exit cross-section is sized to be smaller in area than the entrance cross-section. The at least one ion guide having a plurality of elongated electrodes wherein a gap between the elongated electrodes and the shape of the elongated electrodes in the vicinity of the gap are essentially the same along the length of the at least one ion guide for confining the ions in the vicinity of the gap by a combination of the transverse velocity of the gas and the RF voltage.