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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9146462 B1

PDFFull Text
Date of Patent:
Sep. 29, 2015

Filed:

Jun. 10, 2013

Negative photosensitive resin composition, partition walls for optical device and production process thereof, process for producing optical device having the partition walls, and ink repellent solution

Applicant:

Asahi Glass Company, Limited, Chiyoda-ku, JP;

Inventors:

Kenji Ishizeki, Chiyoda-ku, JP;

Yutaka Furukawa, Chiyoda-ku, JP;

Assignee:

Asahi Glass Company, Limited, Chiyoda-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/004 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); C08G 65/00 (2006.01); C08L 83/08 (2006.01); G03F 7/00 (2006.01); G03F 7/032 (2006.01); C08G 77/16 (2006.01); C08G 77/24 (2006.01); C08G 65/336 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C08G 65/007 (2013.01); C08G 65/336 (2013.01); C08G 77/16 (2013.01); C08G 77/24 (2013.01); C08L 83/08 (2013.01); G02B 5/201 (2013.01); G02B 5/223 (2013.01); G03F 7/0005 (2013.01); G03F 7/0046 (2013.01); G03F 7/032 (2013.01); G03F 7/0755 (2013.01); G03F 7/0757 (2013.01); H01L 27/3246 (2013.01); Y10T 428/24802 (2015.01);
Abstract

To provide a negative photosensitive resin composition which is excellent in storage stability of silanol groups and which is applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition. A negative photosensitive resin composition comprising an ink repellent (A) made of a fluorosiloxane compound having a hydroxy group bonded to a silicon atom and containing fluorine atoms in a proportion of from 10 to 55 mass % based on the total amount of the compound, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, a photopolymerization initiator (C) and a solvent (D), wherein the proportion of the ink repellent (A) is from 0.01 to 10 mass % based on the total solid content of the composition, and the proportion of the hydroxy groups bonded to a silicon atom derived from the ink repellent (A) is from 0.000001 to 1.0 mmol/g based on the total amount of the composition.

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