The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2015

Filed:

Nov. 01, 2011
Applicants:

Marvi A. Matos, Seattle, WA (US);

Liam S. Cavanaugh Pingree, Seattle, WA (US);

Inventors:

Marvi A. Matos, Seattle, WA (US);

Liam S. Cavanaugh Pingree, Seattle, WA (US);

Assignee:

THE BOEING COMPANY, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 14/22 (2006.01); C23C 14/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/228 (2013.01); C23C 14/46 (2013.01); H01J 37/32357 (2013.01); H01J 37/32752 (2013.01); H01J 37/32761 (2013.01); H01J 37/32825 (2013.01); H01J 37/32889 (2013.01);
Abstract

An apparatus may comprise a plasma deposition unit, a movement system, and a mesh system. The plasma deposition unit may be configured to generate a plasma. The movement system may be configured to move a substrate under the plasma deposition unit. The mesh system may be located between the plasma deposition unit and the substrate in which a mesh may comprise a number of materials for deposition onto the substrate and in which the plasma passing through the mesh may cause a portion of the number of materials from the mesh to be deposited onto the substrate.


Find Patent Forward Citations

Loading…