The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2015

Filed:

Sep. 02, 2013
Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Maximilian Vicari, Limburgerhof, DE;

Christian Weichert, Bad Duerkheim, DE;

Dirk Grossschmidt, Mannheim, DE;

Michael Russ, Roemerberg, DE;

Mirko Haider, Maxdorf, DE;

Horst Neuhauser, Dudenhofen, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 3/38 (2006.01); C01B 3/36 (2006.01);
U.S. Cl.
CPC ...
C01B 3/363 (2013.01); C01B 2203/0255 (2013.01); C01B 2203/0805 (2013.01); C01B 2203/0877 (2013.01); C01B 2203/0883 (2013.01); C01B 2203/1235 (2013.01);
Abstract

The invention proposes a method for producing acetylene and synthesis gas by partial oxidation of hydrocarbons with oxygen, wherein a first feedstock (), containing one or more hydrocarbons, and a second feedstock (), containing oxygen, —are preheated separately from one another, —are fed via a burner block (B) to a combustion chamber (F), in which the partial oxidation of the hydrocarbons takes place, —obtaining a cracked gas, which is quenched by injecting a quench oil downstream of the furnace body at 200° C. to 250° C., wherein —a flow of product gas Ig is obtained, which —is cooled in a burner column (BK) with further quench oil, obtaining —a flow of product gas IIg cooled to 60° C. to 90° C., which —is guided into a final cooler (SK), in which a flow of product gas IIIg, cooled to 20° C. to 50° C., is obtained by direct thermal exchange with water, as well as a flow of process water I liq —which is characterized in that the flow of process water I liq is subjected to purification by partial evaporation in a single-stage expansion chamber, wherein the flow of process water I liq is vaporized to a proportion of 0.01 percent by weight to 10 percent by weight, relative to the total weight of same, obtaining a purified flow of process water II liq which is removed in the waste water.


Find Patent Forward Citations

Loading…