The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Jan. 16, 2014
Applicant:

Fuji Electric Co., Ltd., Kawasaki-shi, JP;

Inventor:

Yasuhiko Onishi, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7811 (2013.01);
Abstract

A superjunction semiconductor device is disclosed in which the tradeoff relationship between on-resistance and breakdown voltage is improved greatly so that reverse recovery capability is improved. A drain drift portion substantially corresponds to a portion just under p-base regions serving as an active region and forms a first parallel pn structure in which a first n-type region and a first p-type region are joined to each other alternately and repeatedly. A drain drift portion is surrounded by edge termination region including a second parallel pn structure. Edge termination region is formed such that second n-type and p-type regions oriented consecutively to the first parallel pn structure of the drain drift portion are joined to each other alternately and repeatedly. N-buffer layer is provided between first and second parallel pn structures and n+ drain layer. P-buffer layer is provided selectively inside n-buffer layer in edge termination region.


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