The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

May. 04, 2015
Applicant:

Chunghwa Picture Tubes, Ltd., Taoyuan, TW;

Inventor:

Hsi-Ming Chang, Taoyuan County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/16 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01); H01L 27/12 (2006.01); H01L 21/44 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66969 (2013.01); H01L 21/44 (2013.01); H01L 27/1259 (2013.01); H01L 29/42384 (2013.01); H01L 29/7869 (2013.01);
Abstract

A manufacturing method of an oxide semiconductor thin film transistor according to the disclosure includes the following. A source and a drain are formed. A channel layer is formed between the source and the drain, wherein the channel layer is separated from the source and the drain. An insulation layer is formed, wherein the insulation layer covers the source, the drain, and the channel layer. A first conductor is at least formed in a first opening of the insulation layer, wherein the first conductor contacts the source and the channel layer. A second conductor is at least formed in a second opening of the insulation layer, wherein the second conductor contacts the drain and the channel layer.


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