The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Jan. 23, 2012
Sin Young Kim, Daejeon, KR;
Kyung Ki Hong, Chungcheongbuk-do, KR;
Hyuk Yoon, Gwangmyeong-si, KR;
Won Cheul Ju, Chungcheongbuk-do, KR;
Yong IL Cho, Goyang-si, KR;
Moon Soo Park, Daejeon, KR;
Dong Ho Ko, Cheongju-si, KR;
Su Young Ryu, Daejeon, KR;
Sin Young Kim, Daejeon, KR;
Kyung Ki Hong, Chungcheongbuk-do, KR;
Hyuk Yoon, Gwangmyeong-si, KR;
Won Cheul Ju, Chungcheongbuk-do, KR;
Yong Il Cho, Goyang-si, KR;
Moon Soo Park, Daejeon, KR;
Dong Ho Ko, Cheongju-si, KR;
Su Young Ryu, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.