The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
May. 02, 2012
Andreas Wittmann, Giswil, CH;
Stefan Manzeneder, Sachseln, CH;
Rui Protasio, Lucerne, CH;
Michel Studer, Lucerne, CH;
Thomas Hessler, Sachseln, CH;
Andreas Wittmann, Giswil, CH;
Stefan Manzeneder, Sachseln, CH;
Rui Protasio, Lucerne, CH;
Michel Studer, Lucerne, CH;
Thomas Hessler, Sachseln, CH;
Axetris AG, Kagiswil, CH;
Abstract
This invention relates to a method that makes the measurement of a trace gas concentration invariant or at least less affected to pressure variations in the gas and atmospheric pressure changes. This method neither requires a pressure sensor nor a pressure calibration routine. Furthermore, the method can be applied to other gas species present in the background gas or to the background gas itself that cross-interfere with the target gas of interest. This allows removing any pressure dependency of cross-interference parameters of other gas species and/or the background gas. The new method for accurately measuring a gas concentration is based on optimizing the wavelength modulation amplitude of the laser to minimum pressure dependency.