The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Feb. 10, 2014
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Chung-Shin Wu, Kaohsiung, TW;

Pei-Sun Sheng, Taipei, TW;

Wei-Tse Hsu, Taoyuan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/02 (2006.01); C23C 18/16 (2006.01); C23C 18/54 (2006.01); C23C 18/12 (2006.01); B05D 1/18 (2006.01); B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
C23C 18/02 (2013.01); B05D 1/18 (2013.01); B05D 3/0218 (2013.01); C23C 18/12 (2013.01); C23C 18/1204 (2013.01); C23C 18/1291 (2013.01); C23C 18/1601 (2013.01); C23C 18/1633 (2013.01); C23C 18/54 (2013.01); C23C 18/163 (2013.01); C23C 18/1614 (2013.01); C23C 18/1619 (2013.01);
Abstract

Chemical bath deposition (CBD) apparatuses and fabrication methods for compound thin films are presented. A chemical bath deposition apparatus includes a chemical bath reaction container, a substrate chuck for fixing a substrate arranged face-down toward the bottom of the chemical bath reaction container, multiple solution containers connecting to a reaction solution mixer and further connection to the chemical bath reaction container, and a temperature control system including a first heater controlling the temperature of the chemical bath reaction container, a second heater controlling the temperature of the substrate chuck, and a third heater controlling the temperature of the multiple solution containers.


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