The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Sep. 19, 2011
Applicants:
John Michael Ramsey, Chapel Hill, NC (US);
Laurent Menard, Cary, NC (US);
Valeri Gorbounov, Kingsport, TN (US);
Inventors:
John Michael Ramsey, Chapel Hill, NC (US);
Laurent Menard, Cary, NC (US);
Valeri Gorbounov, Kingsport, TN (US);
Assignee:
The University of North Carolina at Chapel Hill, Chapel Hill, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B01L 3/00 (2006.01); G01N 27/447 (2006.01); B32B 3/30 (2006.01); G01N 21/03 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00547 (2013.01); B01L 3/502707 (2013.01); B32B 3/30 (2013.01); B81C 1/00071 (2013.01); G01N 27/44756 (2013.01); B01L 3/502761 (2013.01); B01L 2200/0663 (2013.01); B01L 2300/0896 (2013.01); B81B 2201/058 (2013.01); B81C 2201/0132 (2013.01); G01N 2021/0346 (2013.01); Y10T 428/24479 (2015.01); Y10T 428/24975 (2015.01);
Abstract
Methods of forming at least one nanochannel include: (a) providing a substrate having a thick single or a thick multi-layer overlayer; (b) milling at least one channel through the overlayer into the substrate; then (c) removing the overlayer; and (d) forming at least one nanochannel in the substrate having an average width and depth dimension that is less than about 10 nm in response to the milling and removing steps.