The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Sep. 19, 2011
John Michael Ramsey, Chapel Hill, NC (US);
Laurent Menard, Cary, NC (US);
Valeri Gorbounov, Kingsport, TN (US);
John Michael Ramsey, Chapel Hill, NC (US);
Laurent Menard, Cary, NC (US);
Valeri Gorbounov, Kingsport, TN (US);
The University of North Carolina at Chapel Hill, Chapel Hill, NC (US);
Abstract
Methods of forming at least one nanochannel include: (a) providing a substrate having a thick single or a thick multi-layer overlayer; (b) milling at least one channel through the overlayer into the substrate; then (c) removing the overlayer; and (d) forming at least one nanochannel in the substrate having an average width and depth dimension that is less than about 10 nm in response to the milling and removing steps.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile