The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Mar. 19, 2014
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Katsuyoshi Onodera, Chino, JP;

Norihiro Masuda, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01); B41J 2/18 (2006.01);
U.S. Cl.
CPC ...
B41J 2/16538 (2013.01); B41J 2/16585 (2013.01); B41J 2/18 (2013.01); B41J 2002/16573 (2013.01);
Abstract

There is provided a head cleaning method in a liquid discharging apparatus which includes a head, a storage section that stores liquid, a circulation flow path that includes a first flow path which supplies the liquid from the storage section to the head and a second flow path which refluxes the liquid from the head to the storage section, a circulation pump, and a wiping section. The head cleaning method includes: a first step of setting a flow rate per unit time of the liquid which flows through the circulation flow path to a first flow rate which is greater than a flow rate in a case in which the liquid is discharged to the recording medium; a second step of the wiping section performing the wiping process after the first step; and a third step of setting the flow rate per unit time of the liquid which flows through the circulation flow path to a second flow rate which is lower than the first flow rate after the second step.


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