The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2015
Filed:
Mar. 04, 2009
Alan Y. Arai, Fremont, CA (US);
Gyu C. Cho, Ann Arbor, MI (US);
Jingzhou Xu, Ann Arbor, MI (US);
Fumiyo Yoshino, San Jose, CA (US);
Haibin Zhang, Portland, OR (US);
James Bovatsek, San Jose, CA (US);
Makoto Yoshida, Ann Arbor, MI (US);
Alan Y. Arai, Fremont, CA (US);
Gyu C. Cho, Ann Arbor, MI (US);
Jingzhou Xu, Ann Arbor, MI (US);
Fumiyo Yoshino, San Jose, CA (US);
Haibin Zhang, Portland, OR (US);
James Bovatsek, San Jose, CA (US);
Makoto Yoshida, Ann Arbor, MI (US);
IMRA AMERICA, INC., Ann Arbor, MI (US);
Abstract
Methods, devices, and systems for ultrashort pulse laser processing of optically transparent materials are presented, with example applications in scribing, marking, welding, and joining. For example, ultrashort laser pulses create multiple scribe features with one pass of the laser beam across the material, with at least one of the scribe features being formed below the surface of the material. Slightly modifying the ultrashort pulse laser processing conditions produces different types of sub-surface marks. When properly arranged, these marks are clearly visible with correctly aligned illumination through either light scattering or light reflection and nearly invisible without illumination. Transparent material other than glass may be utilized. A method for welding transparent materials uses ultrashort laser pulses to create a bond through localized heating. In some embodiments of transparent material processing, a multifocus beam generator simultaneously forms multiple beam waists spaced depthwise relative to the transparent material, thereby increasing processing speed.