The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Nov. 23, 2012
Applicant:

Nidek Co., Ltd., Aichi, JP;

Inventors:

Masaaki Hanebuchi, Aichi, JP;

Michihiro Takii, Aichi, JP;

Masakazu Endo, Aichi, JP;

Assignee:

NIDEK CO., LTD., Aichi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/14 (2006.01); A61B 3/00 (2006.01); A61B 3/10 (2006.01);
U.S. Cl.
CPC ...
A61B 3/0016 (2013.01); A61B 3/0025 (2013.01); A61B 3/1015 (2013.01);
Abstract

An ophthalmic apparatus includes: an input unit configured to obtain corneal incision information that is information on a corneal incision to be formed on a cornea of an examinee's eye; an imaging device configured to image an examinee's eye image; and a controller. The controller is configured to calculate first wavefront aberration distribution that is wavefront aberration distribution of the cornea before incision on the examinee's eye based on the examinee's eye image, obtain incision aberration information corresponding to the corneal incision information; calculate second wavefront aberration distribution that is wavefront aberration distribution after formation of the incision based on the first wavefront aberration distribution and the incision aberration information, and output guide information that guides an intraocular lens surgery based on the second wavefront aberration distribution.


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