The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Dec. 30, 2011
Applicants:

Byung-gook Park, Seoul, KR;

Seongjae Cho, Seoul, KR;

IN Man Kang, Seoul, KR;

Inventors:

Byung-Gook Park, Seoul, KR;

Seongjae Cho, Seoul, KR;

In Man Kang, Seoul, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/775 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/267 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/775 (2013.01); H01L 29/66356 (2013.01); H01L 29/66439 (2013.01); H01L 29/7391 (2013.01); H01L 29/0657 (2013.01); H01L 29/267 (2013.01); H01L 29/42312 (2013.01);
Abstract

Compound tunneling field effect transistors integrated on a silicon substrate are provided with increased tunneling efficiency and an abrupt band slope by forming a source region with a material having a bandgap at least 0.4 electron volts (eV) narrower than that of silicon to increase a driving current (ON current) by forming a channel region with a material having almost no difference in lattice constant from a source region and having a high electron mobility at least 5 times higher than silicon. ON/OFF current ratio simultaneously is increased by forming a drain region with a material having a bandgap at least as wide as a channel region material to restrain OFF current. Tunneling field effect transistors having various threshold voltages according to circuit designs are formed easily by adding a specific material with an electron affinity less than a source region material when forming a channel region.


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