The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jul. 26, 2013
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Guoxiang Ning, Ballston Lake, NY (US);
Soon Yoeng Tan, Singapore, SG;
Seok Yan Poh, Singapore, SG;
Paul Ackmann, Gansevoort, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 23/544 (2006.01); G03F 7/20 (2006.01); G03F 1/42 (2012.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); G03F 1/42 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); G03F 9/7076 (2013.01); H01L 21/70 (2013.01); H01L 2223/5442 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54453 (2013.01);
Abstract
Methods for forming an alignment mark and the resulting mark are disclosed. Embodiments may include forming a first shape having rotational symmetry; forming a second shape; and forming an alignment mark by combining the first shape and one or more of the second shape, wherein the alignment mark has rotational symmetry.