The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jul. 27, 2012
Joo Jib Park, Asan-si, KR;
OH Jin Kwon, Cheonan-si, KR;
Sungho Jang, Cheonan-si, KR;
Boong Kim, Cheonan-si, KR;
Joo Jib Park, Asan-si, KR;
Oh Jin Kwon, Cheonan-si, KR;
Sungho Jang, Cheonan-si, KR;
Boong Kim, Cheonan-si, KR;
SEMES CO., LTD., Seobuk-Gu, KR;
Abstract
Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.