The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Apr. 28, 2014
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
In-Bae Kim, Yongin-si, KR;
Jong-Hyun Choung, Hwaseong-si, KR;
Youngmin Moon, Seongnam-si, KR;
Hongsick Park, Suwon-si, KR;
Gyu-po Kim, Hwaseong-si, KR;
Won-guk Seo, Suwon-si, KR;
Hyun-cheol Shin, Hwaseong-si, KR;
Ki-beom Lee, Seoul, KR;
Sam-young Cho, Anyang-si, KR;
Seung-yeon Han, Yongin-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and water in an amount sufficient for the total weight of the etchant composition to be equal to 100 wt % is disclosed. The etchant composition is suitable for use in forming a metal wiring by etching a metal layer including copper or in fabricating a thin film transistor substrate for a display apparatus.