logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9136104 B1

PDFFull Text
Date of Patent:
Sep. 15, 2015

Filed:

Nov. 11, 2011

Method for cleaning silicon wafer and apparatus for cleaning silicon wafer

Applicants:

Takaaki Chuuman, Tokyo, JP;

Takahiro Kawakatsu, Tokyo, JP;

Katsunobu Kitami, Tokyo, JP;

Hiroshi Morita, Tokyo, JP;

Inventors:

Takaaki Chuuman, Tokyo, JP;

Takahiro Kawakatsu, Tokyo, JP;

Katsunobu Kitami, Tokyo, JP;

Hiroshi Morita, Tokyo, JP;

Assignee:

KURITA WATER INDUSTRIES LTD., Tokyo, JP;

Attorney:

Posz Law Group, PLC

Primary Examiner:

Bibi Carrillo

Int. Cl.
CPC ...
B08B 7/04 (2006.01); H01L 21/02 (2006.01); B08B 3/04 (2006.01); B08B 3/00 (2006.01); B08B 3/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); B08B 3/00 (2013.01); B08B 3/02 (2013.01); B08B 3/04 (2013.01); H01L 21/67057 (2013.01);
Abstract

A silicon wafer after being cleaned by using a cleaning liquid is rinsed by using carbonic water. According to such a silicon wafer cleaning method, generation of static due to a rinsing treatment is not caused, so that an electrostatic breakdown is not caused, adhesion of dirt to a cleaned silicon wafer surface due to the static is not caused, adhesion of metal impurities can be prevented in the rinsing treatment of the silicon wafer and, while giving consideration to the cost, furthermore, a rinsing treatment using a clean rinsing liquid free from causing any residue can be performed.

Find Patent Forward Citations

Chuuman, Takaaki. (2015). Method for cleaning silicon wafer and apparatus for cleaning silicon wafer (U.S. Patent No. 9136104). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9136104

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…