The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Apr. 04, 2013
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Min Kang, Seoul, KR;
Bong-Yeon Kim, Seoul, KR;
Jeong Won Kim, Seoul, KR;
Hyang-Shik Kong, Seongnam-si, KR;
Jin Ho Ju, Seoul, KR;
Kyoung Sik Kim, Seoul, KR;
Seung Hwa Baek, Seoul, KR;
Jun Hyuk Woo, Yongin-si, KR;
Hyun Joo Lee, Seoul, KR;
Abstract
A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.