The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Mar. 13, 2013
Applicant:
Pixtronix, Inc., San Diego, CA (US);
Inventors:
Timothy Brosnihan, Natick, MA (US);
Javier Villarreal, Somerville, MA (US);
Mark B. Andersson, Northborough, MA (US);
Eugene Fike, Amesbury, MA (US);
Assignee:
Pixtronix, Inc., San Diego, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/02 (2006.01); G03B 9/08 (2006.01); G03B 9/02 (2006.01); B81B 7/00 (2006.01); G02B 5/00 (2006.01); G02F 1/29 (2006.01); G09G 3/34 (2006.01); G02B 26/00 (2006.01); G02B 26/08 (2006.01); G02F 1/01 (2006.01);
U.S. Cl.
CPC ...
G02B 26/023 (2013.01); B81B 7/008 (2013.01); G02B 5/005 (2013.01); G02B 26/001 (2013.01); G02B 26/007 (2013.01); G02B 26/02 (2013.01); G02B 26/08 (2013.01); G02B 26/085 (2013.01); G02B 26/0833 (2013.01); G02F 1/01 (2013.01); G02F 1/29 (2013.01); G09G 3/3466 (2013.01); G09G 2300/04 (2013.01);
Abstract
This disclosure provides systems, methods and apparatus for generating images using dual-shutter shutter assemblies. Such shutter assemblies include two shutters that move over a common aperture to selectively obstruct the passage of light there through. In the closed position, portions of one of the shutters overlaps a portion of the other shutter to provide such light obstruction without the two shutters needing to come into contact.