The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jul. 19, 2012
John Bowen, Pittsford, NY (US);
Gary Blough, Ontario, NY (US);
John Bowen, Pittsford, NY (US);
Gary Blough, Ontario, NY (US);
Photon Gear, Inc., Ontario, NY (US);
Abstract
Systems and methods evaluate material in rotary motion. Exposure duration is calculated based upon an intensity of radiation incident upon a sample area of the material and a desired radiation exposure for the material. Angular velocity for a rotational stage is calculated based upon the sample area, the calculated exposure duration, and an initial position of a linear stage. The initial position of the linear stage, the initial velocity of the linear stage, and the initial angular velocity of the rotational stage are set and a radiation generator is activated. The system then waits for time to read the next data sample based upon the calculated exposure duration and a fluorescence level of the material is determined. Angular velocity of the rotational stage and linear velocity of the linear stage are controlled based upon positional sensors to capture data from all areas of the material at the desired radiation exposure.