The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jun. 29, 2012
Wenceslas Rahajandraibe, Marseilles, FR;
Stéphane Meillere, Besse sur Issole, FR;
Edith Kussener, Le Revest les Eaux, FR;
Hervé Barthelemy, Collobrieres, FR;
Wenceslas Rahajandraibe, Marseilles, FR;
Stéphane Meillere, Besse sur Issole, FR;
Edith Kussener, Le Revest les Eaux, FR;
Hervé Barthelemy, Collobrieres, FR;
Centre National de la Recherche Scientifique, Paris, FR;
Universite Du Sud-toulon Var, La Garde, FR;
Universite D'Aix-Marseille, Marseilles, FR;
Abstract
A resistive device which includes at least one strain gauge () comprising silicon nanowires, a power supply () that has at least one current source () able to generate a current (I) for biasing the strain gauge; and acquisition means () able to deliver a measurement signal which can be used to determine the variation in the electrical resistance of the gauge is provided. The power supply includes a chopper () allowing the biasing current generated by each current source to flow through each gauge only during a fraction of an operating cycle of the device.