The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Oct. 01, 2010
Hiroshi Tamagaki, Takasago, JP;
Tadao Okimoto, Takasago, JP;
Toshiki Segawa, Takasago, JP;
Kobe Steel, Ltd., Kobe-shi, JP;
Abstract
The disclosed plasma CVD apparatus () is provided with a vacuum chamber (); a pair of deposition rollers () disposed within the vacuum chamber () that are connected to both poles of an AC power supply and around which a substrate (W) is wound; a gas-supplying device () that supplies process gas containing a source gas to a deposition zone (D) which is a portion of or all of the region that is on one side of a line linking the centers of rotation of the pair of deposition rollers (); and a magnetic-field-generating device () that, by means of the AC power supply being applied to each of the deposition rollers (), forms a magnetic field that causes the source gas in a predetermined region to become plasma. The magnetic-field-generating device () causes the source gas in the region adjacent to the surface of the portion of the pair of deposition rollers () located within the deposition zone (D) to become plasma, forming a plasma region (P). The substrate (W) is wound around the pair of deposition rollers () so as to pass through the plasma region (P).