The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jan. 11, 2013
Siluria Technologies, Inc., San Francisco, CA (US);
Sam Weinberger, San Francisco, CA (US);
Justin Dwight Edwards, Pacifica, CA (US);
Julian Wolfenbarger, Landenberg, PA (US);
Srinivas R. Vuddagiri, Davis, CA (US);
Iraj Isaac Rahmim, San Francisco, CA (US);
Siluria Technologies, Inc., San Francisco, CA (US);
Abstract
Disclosed herein are processes for producing and separating ethane and ethylene. In some embodiments, an oxidative coupling of methane (OCM) product gas comprising ethane and ethylene is introduced to a separation unit comprising two separators. Within the separation unit, the OCM product gas is separated to provide a C-rich effluent, a methane-rich effluent, and a nitrogen-rich effluent. Advantageously, in some embodiments the separation is achieved with little or no external refrigeration requirement.