The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Mar. 14, 2014
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Katsuyoshi Onodera, Chino, JP;

Norihiro Masuda, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/165 (2006.01); B41J 2/18 (2006.01);
U.S. Cl.
CPC ...
B41J 2/16538 (2013.01); B41J 2/16585 (2013.01); B41J 2/18 (2013.01); B41J 2002/16573 (2013.01);
Abstract

In a liquid discharging apparatus that includes a circulation flow path, a head cleaning method includes a first process in which a flow rate of the liquid flowing through the circulation flow path per unit time is set at a first flow rate; a second process in which, after the first process is completed, a wiping unit carries out a wiping operation in a state where the liquid is discharged from the nozzle; a third process in which, after the second process is completed, the wiping unit carries out the wiping operation in a state where the liquid is not discharged from the nozzle; and a fourth process in which, after the third process is completed, a flow rate of the liquid flowing through the circulation flow path per unit time is set at a second flow rate that is lower than the first flow rate.


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