The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Jul. 08, 2010
Toshihiro Kanematsu, Kanagawa, JP;
Masaru Ohgaki, Kanagawa, JP;
Shinji Aoki, Kanagawa, JP;
Shinya Seno, Kanagawa, JP;
Masahiro Masuzawa, Kanagawa, JP;
Hisayoshi Ohshima, Kanagawa, JP;
Yukie Inoue, Kanagawa, JP;
Toshihiro Kanematsu, Kanagawa, JP;
Masaru Ohgaki, Kanagawa, JP;
Shinji Aoki, Kanagawa, JP;
Shinya Seno, Kanagawa, JP;
Masahiro Masuzawa, Kanagawa, JP;
Hisayoshi Ohshima, Kanagawa, JP;
Yukie Inoue, Kanagawa, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A disclosed method for producing a hollow cell array structure includes a first step of layering a deformable material capable of being plastically deformed under a predetermined condition on a first substrate, the first substrate having plural, mutually separated depressions in a surface thereof, such that the deformable material forms mutually isolated spaces in the corresponding depressions; a second step of expanding the spaces in the plural depressions by inducing a gas pressure of the spaces while extending the deformable material on the first substrate, such that plural hollow cells are simultaneously formed in correspondence to the plural depressions in predetermined directions; and a third step of selectively solidifying portions of the plural hollow cells by selectively applying ultraviolet rays thereto.