The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Oct. 26, 2010
Applicants:

Yoshiyuki Nakai, Osaka, JP;

Kazuyuki Ogawa, Osaka, JP;

Kenji Nakamura, Osaka, JP;

Inventors:

Yoshiyuki Nakai, Osaka, JP;

Kazuyuki Ogawa, Osaka, JP;

Kenji Nakamura, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/14 (2012.01); B24D 11/00 (2006.01); B24B 37/24 (2012.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); H01L 21/304 (2013.01);
Abstract

A polishing pad has a polishing layer including a non-foamed polyurethane, wherein the non-foamed polyurethane is a reaction cured body of a polyurethane raw material composition containing an isocyanate-terminated prepolymer obtained by reacting a prepolymer raw material composition containing a diisocyanate, a high-molecular-weight polyol and a low-molecular-weight polyol; an isocyanate modified body polymerized by adding three or more diisocyanates; and a chain extender, and the addition amount of the isocyanate-modified body is 5 to 30 parts by weight with respect to 100 parts by weight of the isocyanate-terminated prepolymer. The polishing pad hardly causes scratches on the surface of an object to be polished and has an improved dressing property.


Find Patent Forward Citations

Nakai, Yoshiyuki. (2015). Polishing pad and method for producing same (U.S. Patent No. 9132524). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9132524

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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