The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

May. 03, 2011
Applicants:

Pinchas Einziger, Haifa, IL;

Amit Rappel, Ofra, IL;

Inventors:

Pinchas Einziger, Haifa, IL;

Eran Ben-Shmuel, Savyon, IL;

Alexander Bilchinsky, Monosson-Yahud, IL;

Amit Rappel, Ofra, IL;

Assignee:

GOJI LIMITED, Hamilton, BM;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 27/00 (2006.01); B01J 19/12 (2006.01); H05B 6/64 (2006.01);
U.S. Cl.
CPC ...
B01J 19/129 (2013.01); H05B 6/64 (2013.01); H05B 6/6447 (2013.01);
Abstract

Apparatuses and methods are disclosed for applying radio frequency (RF) energy to an object in an energy application zone. At least one processor may be configured to cause RF energy to be applied at a plurality of electromagnetic field patterns to the object in the energy application zone. The processor may be further configured to determine an amount of power dissipated in the energy application zone, for each of the plurality of field patterns. The processor may also be configured to determine a spatial distribution of energy absorption characteristics across at least a portion of the energy application zone based on the amounts of power dissipated when the plurality of field patterns are applied to the energy application zone.


Find Patent Forward Citations

Loading…