The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Sep. 26, 2014
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Taisuke Takayanagi, Tokyo, JP;

Shinichiro Fujitaka, Tokyo, JP;

Chihiro Nakashima, Tokyo, JP;

Koji Matsuda, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01); A61N 5/10 (2006.01); G01T 1/29 (2006.01); G01T 1/02 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1071 (2013.01); G01T 1/02 (2013.01); G01T 1/29 (2013.01);
Abstract

A radiation measuring device having a plurality of sensors configured to generate charges in response to the radiation includes a signal processing device. The signal processing device uses an signal generated by a proton beam irradiation device upon changing of beam energy and causes accumulation values of charges output from the sensors to be separately stored in a main control device for each value of the energy. The main control device calculates depth dose profiles for values of the beam energy from the accumulation values stored in the main control device and representing the charges. The main control device calculates a range of the beam for each of the values of the beam energy from the depth dose profiles, corrects the depth dose profiles for the values of the beam energy using a correction coefficient that depends on the range and sums the corrected depth dose profiles.


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