The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Apr. 08, 2010
Shigeo Furuta, Tsukuba, JP;
Touru Sumiya, Tsukuba, JP;
Yuichiro Masuda, Tsukuba, JP;
Tsuyoshi Takahashi, Tsukuba, JP;
Yutaka Hayashi, Tsukuba, JP;
Masatoshi Ono, Tsukuba, JP;
Shigeo Furuta, Tsukuba, JP;
Touru Sumiya, Tsukuba, JP;
Yuichiro Masuda, Tsukuba, JP;
Tsuyoshi Takahashi, Tsukuba, JP;
Yutaka Hayashi, Tsukuba, JP;
Masatoshi Ono, Tsukuba, JP;
Funai Electric Co., Ltd., Daito-Shi, JP;
Abstract
Disclosed is a fabrication method of an element with nanogap electrodes including a first electrode, a second electrode provided above the first electrode, and a gap provided between the first electrode and the second electrode, the gap being in an order of nanometer to allow resistive state to be switched by applying a predetermined voltage between the first electrode and the second electrode, the method comprising: forming the first electrode; forming a spacer on an upper surface of the first electrode; forming the second electrode in contact with an upper surface of the spacer; and removing the spacer to form the gap.