The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Sep. 29, 2014
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventors:

Eun Kyoung Jeon, Gwangju, KR;

Hyun Seo Kang, Gwangju, KR;

Kwon-Seob Lim, Gwangju, KR;

Hyoung Jun Park, Gwangju, KR;

Keo-Sik Kim, Gwangju, KR;

Jeong Eun Kim, Gwangju, KR;

Young Sun Kim, Gwangju, KR;

Young Soon Heo, Gwangju, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 29/16 (2006.01); H01L 21/283 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1606 (2013.01); H01L 21/283 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/30604 (2013.01);
Abstract

Provided is a method of fabricating a graphene nano device. The method includes forming a first metal mask pattern on a substrate on which a graphene layer is formed, and forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask. The forming of the first metal mask pattern includes forming a first adhesive layer on the graphene layer, disposing the first metal mask pattern prepared in advance on the first adhesive layer, and heating the first adhesive layer to attach the first metal mask pattern on the substrate.


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