The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

May. 03, 2013
Applicant:

Sony Corporation, Tokyo, JP;

Inventors:

Yasuhiro Yamada, Kanagawa, JP;

Ryoichi Ito, Aichi, JP;

Tsutomu Tanaka, Kanagawa, JP;

Makoto Takatoku, Kanagawa, JP;

Michiru Senda, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/14 (2006.01); H01L 27/146 (2006.01); H01L 29/786 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 27/146 (2013.01); H01L 27/14623 (2013.01); H01L 27/14632 (2013.01); H01L 27/14663 (2013.01); H01L 27/14676 (2013.01); H01L 29/7831 (2013.01); H01L 29/78633 (2013.01); H01L 27/14643 (2013.01);
Abstract

Disclosed herein is a transistor including: a semiconductor layer; a first gate insulation film and a first interlayer insulation film which are provided on a specific surface side of the semiconductor layer; a first gate electrode provided at a location between the first gate insulation film and the first interlayer insulation film; an insulation film provided on the other surface side of the semiconductor layer; source and drain electrodes provided by being electrically connected to the semiconductor layer; and a shield electrode layer provided in such a way that at least portions of the shield electrode layer face edges of the first gate electrode, wherein at least one of the first gate insulation film, the first interlayer insulation film and the insulation film include a silicon-oxide film.


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