The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Dec. 17, 2012
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Makoto Onodera, Hitachinaka, JP;

Ichiro Nishigaki, Ishioka, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06T 17/20 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G06T 17/20 (2013.01);
Abstract

Generation of a mesh model that can be analyzed with sufficient analysis accuracy for result evaluation and within a minimum possible calculation time even if a user does not grasp a tradeoff relation between analysis accuracy and analysis time due to mesh size is made possible. A mesh generation system designates an evaluation point (site) on an analysis target shape, analyzes plural analysis model data created with plural types of mesh size, stores a relation among mesh size, analysis result and calculation time in a mesh know-how DB, search for a mesh size which meets a required accuracy and calculation time limit, sets the mesh size that is found by the search to an analysis model. And displays the relation among mesh size, analysis result and calculation time.


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