The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Aug. 19, 2013
Apple Inc., Cupertino, CA (US);
Napthaneal Yuen Tan, San Jose, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
The embodiments described herein relate to methods, devices, and systems for masking a substrate using a photomasking process. An adaptive photomask configured to generate a photomasking pattern in accordance with dimensions of a surface feature on substrate is described. The adaptive photomask can be used to create customized photomask patterns for individual substrates. Methods and devices described herein can be used in manufacturing processes where similar parts having slight differences due to built-in tolerances are manufactured. Methods and a devices described herein can also be used in manufacture processes involving masking of three-dimensional portions of a part. A photomasking system that includes a translational mechanism for scanning a substrate surface is described.