The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Sep. 22, 2014
Franklin Mark Schellenberg, Palo Alto, CA (US);
Keith Edward Bennett, Palo Alto, CA (US);
Franklin Mark Schellenberg, Palo Alto, CA (US);
Keith Edward Bennett, Palo Alto, CA (US);
Other;
Abstract
A method of performing nanopatterning is disclosed, comprising the use of a system comprising a plasmonic writing head that enables super-resolution exposures. The super-resolution exposures are carried out using light directed onto a data recording medium using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the 'bow-tie' and 'C-aperture' are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a data recording medium. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.