The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Apr. 06, 2012
Applicants:
Koji Ichikawa, Osaka, JP;
Takahiro Yasue, Osaka, JP;
Satoshi Yamaguchi, Osaka, JP;
Inventors:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01);
Abstract
A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I),
Ichikawa, Koji. (2015). Resist composition and method for producing resist pattern (U.S. Patent No. 9128373). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9128373
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile