The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Mar. 26, 2012
Kouhei Takahashi, Chiba, JP;
Takeshi Kuriyagawa, Mobara, JP;
Daisuke Sonoda, Chiba, JP;
Takuo Kaitoh, Mobara, JP;
Katsumi Matsumoto, Mobara, JP;
Kouhei Takahashi, Chiba, JP;
Takeshi Kuriyagawa, Mobara, JP;
Daisuke Sonoda, Chiba, JP;
Takuo Kaitoh, Mobara, JP;
Katsumi Matsumoto, Mobara, JP;
Pixtronix, Inc., San Diego, CA (US);
Abstract
A metal layer is formed on a highly light-transmissive substrate; a resist mask having an opening pattern is formed on the metal layer; exposed portions of the metal layer is etched away in this state to form openings; then the resist mask is removed; and a surface of the metal layer and an inner side wall of each of the openings are oxidized to form a metal oxide layer. Thus, a front surface and a rear surface of the aperture plate are caused to have different reflectances. The oxide layer is formed at the same time as when the resist mask is ashed to remove resist.