The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Dec. 29, 2011
Applicants:
Fu-tien Weng, Hsinchu, TW;
Yu-kun Hsiao, Hsinchu, TW;
Inventors:
Fu-Tien Weng, Hsinchu, TW;
Yu-Kun Hsiao, Hsinchu, TW;
Assignee:
VisEra Technologies Company Limited, Hsinchu Science Park, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G02B 3/00 (2006.01); C23C 16/40 (2006.01); G02B 1/115 (2015.01); H01L 27/146 (2006.01); C23C 16/02 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0006 (2013.01); C23C 16/0272 (2013.01); C23C 16/402 (2013.01); C23C 16/505 (2013.01); G02B 1/115 (2013.01); G02B 3/0012 (2013.01); H01L 27/14627 (2013.01);
Abstract
A microlens structure is provided. The microlens structure includes a microlens element having a first refraction index. A first film is disposed on the microlens element, wherein the first film has a second refraction index less than the first refraction index. A second film is disposed on the first film, wherein the second film has a third refraction index less than the second refraction index and greater than a refraction index of air. Further, a fabrication method of the microlens structure is also provided.